Self Assembled Monolayers (Sams) of Methimazole on Copper in Corrosion Protection
A Rajalakshmi Devi1, S. Ramesh2, V. Periasamy3
1A. Rajalakshmi Devi, Department of Chemistry, The Gandhigram Rural Institute, Deemed University, Gandhigram 624 302 – India.
2S. Ramesh, Department of Chemistry, The Gandhigram Rural Institute, Deemed University, Gandhigram 624 302 – India.
3V. Periasamy, Department of Chemistry, The Gandhigram Rural Institute, Deemed University, Gandhigram 624 302 – India.
Manuscript received on 23 May 2015 | Revised Manuscript received on 30 May 2015 | Manuscript published on 30 May 2015 | PP: 43-54 | Volume-4 Issue-2, May 2015 | Retrieval Number: B1418054215©BEIESP
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© The Authors. Blue Eyes Intelligence Engineering and Sciences Publication (BEIESP). This is an open access article under the CC-BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/)
Abstract: Self assembled monolayers (SAMs) are formed on copper using Methimazole, under suitable conditions. Corrosion behaviour of copper is studied in neutral medium of 300 ppm aqueous sodium chloride solution using weight loss followed by electrochemical (impedance, potentiodynamic polarization), cyclic voltammetric studies. With the high charger transfer resistance, an efficiency of 95% is observed. The protective film formed on the surface is characterised by water contact angle measurements, FT-IR, SEM/EDX, and AFM studies. Potentiodynamic polarization studies have shown that SAMs control both anodic and cathodic reactions, but cathodic reactions more predominantly and behave as a mixed inhibitor. The surface film formed is found to be stable. The presence of nitrogen and sulphur in the inhibitor molecules on the metal surface due to chemisorption is analysed using EDX.
Keywords: Corrosion inhibition, SAMs, Methimazole.
Scope of the Article: Algorithm Engineering