Nanometer Effect of Magnetic Dot Size for 40nm Dot Pitch Patterned Media Prepared by Electron Beam Lithography and Ion Milling Measured Using Micro X-Ray Magnetic Circular Dichroism
Zulfakri Mohamad1, Rosalena Irma Alip2, You Yin3, Sumio Hosaka4
1Zulfakri Mohamad, Faculty of Electrical Engineering, Universiti Teknologi MARA, Shah Alam, Selangor Malaysia.
2Rosalena Irma Alip, Faculty of Electrical Engineering, Universiti Teknologi MARA, Shah Alam, Selangor Malaysia.
3You Yin, Faculty of Science and Technology, Gunma University, Kiryu, Japan.
4Sumio Hosaka, Faculty of Science and Technology, Gunma University, Kiryu, Japan.
Manuscript received on 15 April 2019 | Revised Manuscript received on 19 May 2019 | Manuscript published on 30 May 2019 | PP: 3144-3148 | Volume-8 Issue-1, May 2019 | Retrieval Number: A1470058119/19©BEIESP
Open Access | Ethics and Policies | Cite | Mendeley | Indexing and Abstracting
© The Authors. Blue Eyes Intelligence Engineering and Sciences Publication (BEIESP). This is an open access article under the CC-BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/)
Abstract: The effect of difference magnetic dot size for 40 nm dot pitch arrays as measured by Micro XMCD has been studied. A 40-nm magnetic dot pitch with varying dot size has been fabricated. A 30 KeV Electron Beam Lithography was used to fabricate the Calixarene dot pitch on CoPt magnetic film. Dot resist was used as a mask to ion mill the CoPt magnetic film using ion milling equipment at 400 kV, 50 mA, and Ar for acceleration voltage, ion current, and gas, respectively. The ESMH curve of magnetic dot arrays was measured via Micro X-Ray Magnetic Circular Dichroism at Beam Line BL39XU in Spring-8. The results show that all coercive forces for magnetic dot arrays are the same at 0.35 kOe. There are no increments when the dot diameter size decreased. The ESMH curve also shows when the dot diameter became smaller, the intensity of XMCD drastically decreased. These results indicate that a dot diameter of less than 25 nm has no effect on the coercive force at 40 nm dot pitch.
Index Terms: Patterned Media, EBL, Ion Milling, Micro XMCD.
Scope of the Article: Nanometer-Scale Integrated Circuits